The CVD process produces pyrolytic boron nitride (PBN) VGF crucibles to form their solids, and all boron nitride crystals grow parallel to the surface of the vapor deposition. VGF crucible is a crucible for vertical gradient solidification (VGF) technology. VGF technology is currently a popular single-crystal growth technology and a good choice for growing GaAs single crystal and InP single crystal in the micro-optoelectronics and semiconductor industries.

The CVD process gives this pyrolytic boron nitride a near-perfect layered structure, resulting in anisotropic thermal conductivity, making it an ideal material for making crystal growth crucibles. Vertical Gradient Freezing (VGF) is a popular crystal production technology and PBN VGF crucibles are specialized consumables for this process.

Pyrolytic Boron Nitride (PBN) VGF Crucible Dimensions

Item

Inside Diameter

Height

Thickness

Taper

VGF-1

2″

10″

0.035″

0.70°

VGF-2

3″

10″

0.035″

0.70°

VGF-3

4″

8″

0.035″

0.50°

VGF-4

5″

8″

0.04″

0.30°

VGF-5

6″

7″

0.04″

0.30°

Application

VGF technology is currently a popular single-crystal growth technology and a good choice for growing GaAs single crystal and InP single crystal in the micro-optoelectronics and semiconductor industries.

Packing

As a ceramic material, boron nitride is quite fragile in a lot of cases. The Pyrolytic Boron Nitride (PBN) VGF crucibles are usually held in plastic bags by vacuum, and protected with heavy foam.